BDBComp - Biblioteca Digital Brasileira de Computação

XIX Symposium on Microelectronics Technology and Devices - 2004 - Porto de Galinhas, PE, Brasil

60 registros retornados

N. Nenadovic, L. K. Nanver, J. W. Slotboom. Electrothermal limitations on the current density of high-frequency bipolar transistors. Buscar na Web Processando consulta.
C. D. G. dos Santos, M. A. Pavanello, J. A. Martino, D. Flandre, J. P. Raskin. Behavior of graded channel SOI gate-all-around NMOSFET devices at high temperatures. Buscar na Web Processando consulta.
M. Souza, M. A. Pavanello, B. Iñiguez, D. Flandre. A fully analytical continuous model for graded-channel SOI MOSFET for analog applications. Buscar na Web Processando consulta.
G. Wirth, J. Koh, R. da Silva, R. Thewes, R. Brederlow. Low-frequency noise in deep-submicron MOSFETs. Buscar na Web Processando consulta.
M. A. Pavanello, J. A. Martino, E. Simoen, C. Claeys. Evaluation of the channel engineering impact on the analog performance of deep-submicrometer partially depleted SOI MOSFETs at low temperatures. Buscar na Web Processando consulta.
A. I. A. Cunha, M. C. Schneider, C. Galup-Montoro, C. D. C. Caetano, M. B. Machado. Extraction of MOSFET effective channel length and width based on the transconductance-to-current ratio. Buscar na Web Processando consulta.
C. J. Wei, J. Gering, Y. A. Tkachenko. Enhanced high-current VBIC model. Buscar na Web Processando consulta.
Janaina Gonçalves Guimaraes, Lea Mendonca Nobrega, Jose Camargo da Costa. Single-electron winner-take-all macro block for large-scale integrated neural networks. Buscar na Web Processando consulta.
C. Verissimo, S. A. Moshkalyov, A. C. S. Ramos, J. L. Gonçalves, J. León, J. W. Swart. Study of carbon nanotubes growth by atmospheric pressure chemical vapor deposition. Buscar na Web Processando consulta.
M. V. Batistuta, M. F. Stella, H. Biagi, J. C. da Costa. Simulation of dissipative electron dynamics in coupled quantum wells. Buscar na Web Processando consulta.
Fabiano Fruett, Vitor Garcia, Renato Pavanello. Micro-electromechanical simulation of a CMOS pressure sensor. Buscar na Web Processando consulta.
Roberto R. Neli, Ioshiaki Doi, Arline M. Melo, Cristiano J. N. Arbex, Maria B. P. Zakia, Pierre Kaufmann, José A. Diniz, Jacobus W. Swart.. Uncooled thermal infrared detector for detection of far-infrared radiation. Buscar na Web Processando consulta.
C. Scoralick Júnior, I. Doi, R. C. Teixeira, J. A. Diniz, J. W. Swart. Stress analysis of vertical LPCVD thick poly-Si by micro-Raman spectroscopy for MEMS applications. Buscar na Web Processando consulta.
N. C. Frateschi, J. Zhang, W. J. Choi, H. Gebretsadik, R. Jambunathan, A. E. Bond.. InGaAlAs multi-quantum-well electro-absorption modulators for 10Gb/s uncooled operation in the C-band. Buscar na Web Processando consulta.
V. C. Silva, L. T. Dornelles, P. P. Canazio, F. V. dos Santos, A. Mesquita, M. V. da Silva. Radiation-tolerant CMOS APS arrays. Buscar na Web Processando consulta.
S. N. M. Mestanza, C. Biasotto, A. C.Costa, G. O. Dias, I. Doi, J. A. Diniz, J. W. Swart. High sensitivity obtained by three-color detector APS-CMOS using antireflective coating. Buscar na Web Processando consulta.
C. V.-B. Tribuzy, M. C. L. Areiza, S. M. Landi, M. Borgstrom, M. P. Pires, P. L. Souza. Improved performance of amplitude modulator structures containing an nipi delta doping superlattice. Buscar na Web Processando consulta.
Hugo Puertas de Araújo, Sebastião G. dos Santos Filho, Márcio de Almeida Valle. Birefringence characterization of TiO2 thin films deposited by DC sputtering over tilted substrates. Buscar na Web Processando consulta.
J. Y. Delétage, H. Frémont, O. Puig, C. Pellet, P. Fouillat Y. Danto. Test chip for qualification of packaging assemblies. Buscar na Web Processando consulta.
C. C. S. Nicole, E. H. E. C. Eummelen, R. H. W. Pijnenburg, R. Dekker, C. Lasance. Silicon micro-channel cooling device. Buscar na Web Processando consulta.
F. Darracq, H. Lapuyade, P. Fouillat, V. Pouget, D. Lewis, Y. Danto. Evaluation of SRAMs reliability for space electronics using ultra short laser pulses. Buscar na Web Processando consulta.
R. D. Mansano, A. P. Mousinho, L. S. Zambom, M. S. de Medeiros, P. Verdonck, M. Guerino, M. Massi. The influence of additives on electrical characteristics of DLC films deposited by reactive sputtering. Buscar na Web Processando consulta.
Ronaldo W. Reis, Sebastião G. dos Santos Filho, Ioshiaki Doi, Jacobus W. Swart. Formation of nickel silicides onto as-doped silicon using a thin Pt/Pd interlayer. Buscar na Web Processando consulta.
Laura Swart, Patrick Verdonck. The influence of the AC component of the plasma potential on the measurements of ion flux. Buscar na Web Processando consulta.
Nemer P. Fioravante Jr., Leandro T. Manera, Stanislav A. Moshkalyov, José A. Diniz, Peter J. Tatsch, Hugo R. J. Grados, I. Doi, Jacobus W. Swart. Control of micron and submicron feature dimension dimensions in 2um resolution photolithographic system for MOS and MEMS applications. Buscar na Web Processando consulta.
Victor O Guidini, Stanislav A. Moshkalyov, Peter J. Tatsch. Deep dry etching of silicon using Bosch type process. Buscar na Web Processando consulta.
A. M. Daltrini, S. A. Moshkalyov, A. C. S. Ramos, J. W. Swart. Use of a Langmuir probe for ECR plasma characterization. Buscar na Web Processando consulta.
Patrick Verdonck. Oxygen plasma etching mechanisms of resist. Buscar na Web Processando consulta.
Daniel Scodeler Raimundo, Francisco Javier Ramirez Fernandez, Walter Jaimes Salcedo. Self-assembled polystyrene micro-spheres applied for photonic crystals and template fabrication. Buscar na Web Processando consulta.
W. A. Nogueira, S. G. dos Santos Filho. Characterization of thin MOS gate oxides grown in pyrogenic environment. Buscar na Web Processando consulta.
S. T. Shibatta-Kagesawa, E. B. Araújo, N. Oki. Dielectric and Ferroelectric Properties of PZT and PT Thin Films for SAW Sensors applications. Buscar na Web Processando consulta.
Silvia Yukie Nagazawa, Ricardo Cury Ibrahim. Electrothermal synthesis and structural analysis of BaTiO3 thin films. Buscar na Web Processando consulta.
R. D. Martinez, A. N. R. da Silva, R. Furlan, I. Ramos, J. J. Santiago-Avilés. Analysis of electrospinning of nanofibers as a function of polyacrylonitrile (PAN) concentration. Buscar na Web Processando consulta.
Jaap Hoekstra. Modeling nanoelectronic devices in circuit theory: the single-electron tunneling junction. Buscar na Web Processando consulta.
Hector De Los Santos. NanoMEMS systems on chip. Buscar na Web Processando consulta.
William J. Schaff. III-Nitrides by Molecular Beam Epitaxy for Longer and Shorter Wavelengths. Buscar na Web Processando consulta.
Henri Boudinov. Shalow junctions in SIMOX. Buscar na Web Processando consulta.
Regis E. Santos, Ioshiaki Doi, Ricardo C. Teixeira, José A. Diniz, Jacobus W. Swart, Sebastião G. dos Santos. Formation and Stability of Ni(Pt)Si/Poly-Si Layered Structure. Buscar na Web Processando consulta.
M. A. Pavanello, A. Cerdeira, J. A. Martino, M. A. Alemán, D. Flandre. Analysis of Harmonic Distortion in Graded-Channel SOI MOSFETs at High Temperatures. Buscar na Web Processando consulta.
R. S. Ferreira, M. A. Pavanello. Improved Current Mirror Performance Using Graded-Channel Silicon-On-Insulator Devices in High Temperature Operation. Buscar na Web Processando consulta.
G. A. Manera, J. A. Diniz, S. A. Moshkalyov, G. S. Lujan, I. Doi, J. W. Swart. Silicon oxynitride gate-dielectric made by ECR plasma oxynitridation. Buscar na Web Processando consulta.
E. Y. Arashiro, M. N. P. Carreno. Polymeric corrugated membranes of PMMA fabricated by micro-casting technique for MOEMS and optical applications. Buscar na Web Processando consulta.
R. Giacomini J. A. Martino. An Improved Model for the Triangular SOI Misalignment Test Structure. Buscar na Web Processando consulta.
A. I. A. Cunha, M. C. Schneider, C. Galup-Montoro, C. D. C. Caetano, M. B. Machado. Unambiguous Extraction of Threshold Voltage Based on the ACM Model. Buscar na Web Processando consulta.
Alexandre Ichiro Hashimoto, Giuliano Gozzi, Sebastião G. dos Santos Filho. Growth and morphology of electroless cobalt thin films deposited onto palladium pre-activated silicon surfaces. Buscar na Web Processando consulta.
C. Biasotto, B. Monte, R. R. Neli, A. C. S. Ramos, J. A. Diniz, S. A. Moshkalyov, I. Doi, J. W. Swart.. Suspended membranes made by silicon nitride deposited by ECR-CVD. Buscar na Web Processando consulta.
S. N. M. Mestanza, G. O. Dias, J. E. C. Queiroz, I. Doi, J. W. Swart, E. Rodriguez, A. A. R. Neves, H. Martinho. Preparation and characterization of silicon nanostructures obtained by ion implantation. Buscar na Web Processando consulta.
C. Reyes-Betanzo, S. A. Moshkalyov. Reactive ion etching of SiGe using halogen-based plasmas. Buscar na Web Processando consulta.
C. M. Lapa, I. B. Vasconcelos, E. J. P. Santos, Y. P. Yadava. Production, sintering, characterization of Ba2MgWO6 ceramics for ceramic components for planar RTD applications. Buscar na Web Processando consulta.
H. C. do Carmo, J. G. Guimaraes, L. M. Nobrega, J. Camargo da Costa. Simulation of basic circuits for implementing a single-electron stochastic associative memory. Buscar na Web Processando consulta.
A. R. Oliveira, M. N. P. Carreno. Formation of 3C-SiC films on silicon by thermal annealing process. Buscar na Web Processando consulta.
P. C. M. Machado, A. B. Aguiar Marques, K. F. Vaz. Modeling the impact of discretized donor distribution for ultra-small field effect transistors. Buscar na Web Processando consulta.
O. F. Rocha, C. E. Viana, L. C. D. Gonçalves, N. I. Morimoto. Electrical characteristics of PECVD silicon oxide deposited with low TEOS contents at low temperatures. Buscar na Web Processando consulta.
S. M. Rajab, I. C. Oliveira, M. Massi, H. S. Maciel. Properties of amorphous SiC thin film grown by RF magnetron sputtering. Buscar na Web Processando consulta.
K. F. Albertin, I. Pereyra. One Mask Step a-Si/a-SiOxNy Thin Film Transistor. Buscar na Web Processando consulta.
Ana Carolina Bueno, Maira Paulilo Shiki, Valdemir Ronaldo de Lima, Luis Gustavo L. Brandão, Mauricio Massazumi Oka. Analysis of measurement systems and DOE for reflow soldering process in SMT. Buscar na Web Processando consulta.
Ricardo C. Teixeira, Ioshiaki Doi, José A. Diniz, Jacobus W. Swart, M. B. P. Zakia, Sebastião G. dos Santos. Characteristics of polycrystalline Si1-XGeX alloy deposited in a vertical LPCVD system. Buscar na Web Processando consulta.
Robson Vieira, Valter Martarello, Stanislav A. Moshkalyov, José Alexandre Diniz, Jacobus W. Swart. Selective etching of polycristalline silicon in a hexode type plasma etcher. Buscar na Web Processando consulta.
G. Rehder, M. N. P. Carreno. Controlled motion in microbrigdes of silicon carbide obtained by PECVD. Buscar na Web Processando consulta.
Leandro Zeidan Toquetti, Sebastião Gomes dos Santos Filho, José Alexandre Diniz, Jacobus W. Swart. Electrical characterization of thin gate oxynitride obtained by N+ implantation into polysilicon/thermal oxide/ silicon structure. Buscar na Web Processando consulta.